Abstract
We report the implementation of energy-dispersive x-ray spectroscopy for high-resolution inspection of layered semiconductors in the form of atomically thin transition metal dichalcogenides down to the monolayer limit. The technique is based on a scanning electron microscope equipped with a silicon drift detector for energy-dispersive x-ray analysis. By optimizing operational parameters in numerical simulations and experiments, we achieve layer-resolving sensitivity for few-layer crystals down to the monolayer, and demonstrate elemental composition profiling in vertical and lateral heterobilayers of transition metal dichalcogenides. The technique can be straightforwardly applied to other layered two-dimensional materials and van der Waals heterostructures, thus expanding the experimental toolbox for quantitative characterization of layer number, atomic composition, or alloy gradients for atomically thin materials and devices.
| Dokumententyp: | Zeitschriftenartikel |
|---|---|
| Fakultät: | Physik |
| Fakultätsübergreifende Einrichtungen: | Center for NanoScience (CENS) |
| Themengebiete: | 500 Naturwissenschaften und Mathematik > 530 Physik
500 Naturwissenschaften und Mathematik > 500 Naturwissenschaften |
| ISSN: | 2331-7019 |
| Sprache: | Englisch |
| Dokumenten ID: | 114979 |
| Datum der Veröffentlichung auf Open Access LMU: | 02. Apr. 2024 08:08 |
| Letzte Änderungen: | 02. Apr. 2024 08:08 |
| DFG: | Gefördert durch die Deutsche Forschungsgemeinschaft (DFG) - 390814868 |
