Abstract
We report the implementation of energy-dispersive x-ray spectroscopy for high-resolution inspection of layered semiconductors in the form of atomically thin transition metal dichalcogenides down to the monolayer limit. The technique is based on a scanning electron microscope equipped with a silicon drift detector for energy-dispersive x-ray analysis. By optimizing operational parameters in numerical simulations and experiments, we achieve layer-resolving sensitivity for few-layer crystals down to the monolayer, and demonstrate elemental composition profiling in vertical and lateral heterobilayers of transition metal dichalcogenides. The technique can be straightforwardly applied to other layered two-dimensional materials and van der Waals heterostructures, thus expanding the experimental toolbox for quantitative characterization of layer number, atomic composition, or alloy gradients for atomically thin materials and devices.
Dokumententyp: | Zeitschriftenartikel |
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Fakultät: | Physik |
Fakultätsübergreifende Einrichtungen: | Center for NanoScience (CENS) |
Themengebiete: | 500 Naturwissenschaften und Mathematik > 530 Physik
500 Naturwissenschaften und Mathematik > 500 Naturwissenschaften |
ISSN: | 2331-7019 |
Sprache: | Englisch |
Dokumenten ID: | 114979 |
Datum der Veröffentlichung auf Open Access LMU: | 02. Apr. 2024, 08:08 |
Letzte Änderungen: | 02. Apr. 2024, 08:08 |
DFG: | Gefördert durch die Deutsche Forschungsgemeinschaft (DFG) - 390814868 |