Abstract
We report the implementation of energy-dispersive x-ray spectroscopy for high-resolution inspection of layered semiconductors in the form of atomically thin transition metal dichalcogenides down to the monolayer limit. The technique is based on a scanning electron microscope equipped with a silicon drift detector for energy-dispersive x-ray analysis. By optimizing operational parameters in numerical simulations and experiments, we achieve layer-resolving sensitivity for few-layer crystals down to the monolayer, and demonstrate elemental composition profiling in vertical and lateral heterobilayers of transition metal dichalcogenides. The technique can be straightforwardly applied to other layered two-dimensional materials and van der Waals heterostructures, thus expanding the experimental toolbox for quantitative characterization of layer number, atomic composition, or alloy gradients for atomically thin materials and devices.
Item Type: | Journal article |
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Faculties: | Physics |
Research Centers: | Center for NanoScience (CENS) |
Subjects: | 500 Science > 530 Physics 500 Science > 500 Science |
ISSN: | 2331-7019 |
Language: | English |
Item ID: | 114979 |
Date Deposited: | 02. Apr 2024, 08:08 |
Last Modified: | 02. Apr 2024, 08:08 |
DFG: | Gefördert durch die Deutsche Forschungsgemeinschaft (DFG) - 390814868 |