Photocatalytic Nanosheet Lithography: Photolithography based on Organically Modified Photoactive 2D Nanosheets

Ganter, Pirmin and Lotsch, Bettina V. (2017): Photocatalytic Nanosheet Lithography: Photolithography based on Organically Modified Photoactive 2D Nanosheets. In: Angewandte Chemie-international Edition, Vol. 56, No. 29: pp. 8389-8392

Abstract

Harvesting the properties of nanosheets is not only crucial from a fundamental perspective, but also for the development of novel functional devices based on 2D nano-sheets. Herein, we demonstrate the processing of organically modified TBA(x)H(1-x)Ca(2)Nb(3)O(10) nanosheets into photonic thin films and study their colorimetric sensing properties in response to various aqueous and organic solvent vapors. Building on the enhanced solvent accessibility of TBAcontaining nanosheets and their photocatalytic activity under UV irradiation, we develop a new concept for photocatalytic lithography using TBA(x)H(1-x)Ca(2)Nb(3)O(10) nanosheets as a negative photoresist to obtain high-fidelity micron-scale patterns of robust inorganic nanosheets. Photocatalytic nanosheet lithography (PNL) therefore adds a new resist-free, resource efficient direct patterning technique to the toolbox of photolithography.

• Item Type: Journal article
• Faculties: Chemistry and Pharmacy > Department of Chemistry
• Subjects: 500 Science > 540 Chemistry
• ISSN: 1433-7851
• Language: English