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Waheed, E.; Urquijo, P.; Ferlewicz, D.; Adachi, I.; Adamczyk, K.; Aihara, H.; Al Said, S.; Asner, D. M.; Atmacan, H.; Aushev, T.; Ayad, R.; Babu, V.; Badhrees, I.; Bansal, V.; Behera, P.; Beleno, C.; Bernlochner, F.; Bhuyan, B.; Bilka, T.; Biswal, J.; Bobrov, A.; Bonvicini, G.; Bozek, A.; Bracko, M.; Browder, T. E.; Campajola, M.; Cervenkov, D.; Chang, P.; Chekelian, V.; Chen, A.; Cheon, B. G.; Chilikin, K.; Cho, H. E.; Cho, K.; Choi, S. -K.; Choi, Y.; Choudhury, S.; Cinabro, D.; Cunliffe, S.; Di Carlo, S.; Dolezal, Z.; Dong, T. V.; Dossett, D.; Eidelman, S.; Epifanov, D.; Fast, J. E.; Fulsom, B. G.; Garg, R.; Gaur, V.; Garmash, A.; Giri, A.; Goldenzweig, P.; Golob, B.; Grzymkowska, O.; Haba, J.; Hara, T.; Hayasaka, K.; Hayashii, H.; Hedges, M. T.; Hou, W. -S.; Hsu, C. -L.; Iijima, T.; Inami, K.; Inguglia, G.; Ishikawa, A.; Iwasaki, M.; Iwasaki, Y.; Jacobs, W. W.; Jeon, H. B.; Jia, S.; Jin, Y.; Joffe, D.; Joo, K. K.; Kahn, J.; Kaliyar, A. B.; Karyan, G.; Kawasaki, T.; Kim, C. H.; Kim, D. Y.; Kim, K. T.; Kim, S. H.; Kinoshita, K.; Kodys, P.; Korpar, S.; Kotchetkov, D.; Krizan, P.; Kröger, R.; Krokovny, P.; Kuhr, T.; Kulasiri, R.; Kuzmin, A.; Kwon, Y. -J.; Lange, J. S.; Lee, J. Y.; Lee, S. C.; Li, C. H.; Li, L. K.; Li, Y. B.; Gioi, L. Li; Libby, J.; Lieret, K.; Liventsev, D.; Lu, P. -C.; Luo, T.; MacNaughton, J.; Masuda, M.; Matvienko, D.; Merola, M.; Metzner, F.; Miyabayashi, K.; Miyata, H.; Mizuk, R.; Mohanty, G. B.; Mori, T.; Mussa, R.; Nakamura, I.; Nakao, M.; Nath, K. J.; Natkaniec, Z.; Nayak, M.; Niiyama, M.; Nisar, N. K.; Nishida, S.; Nishimura, K.; Ogawa, S.; Ono, H.; Pakhlov, P.; Pakhlova, G.; Pal, B.; Pardi, S.; Park, H.; Park, S. -H.; Paul, S.; Pestotnik, R.; Piilonen, L. E.; Popov, V.; Prencipe, E.; Prim, M.; Rostomyan, A.; Russo, G.; Sakai, Y.; Salehi, M.; Sandilya, S.; Sanuki, T.; Savinov, V.; Schneider, O.; Schnell, G.; Schueler, J.; Schwanda, C.; Seino, Y.; Senyo, K.; Seon, O.; Sevior, M. E.; Shebalin, V.; Shen, C. P.; Shiu, J. -G.; Shwartz, B.; Simon, F.; Sokolov, A.; Solovieva, E.; Stanic, S.; Staric, M.; Stottler, Z. S.; Strube, J. F.; Sumiyoshi, T.; Takizawa, M.; Tanida, K.; Tenchini, F.; Trabelsi, K.; Uchida, M.; Uglov, T.; Unno, Y.; Uno, S.; Usov, Y.; Varner, G.; Varvell, K. E.; Vinokurova, A.; Vossen, A.; Wang, C. H.; Wang, M. -Z.; Wang, P.; Won, E.; Yang, S. B.; Ye, H.; Yusa, Y.; Zhang, Z. P.; Zhilich, V. und Zhukova, V. (2019): Measurement of the CKM matrix element vertical bar V-cb vertical bar from B-0 -> D*(-)l(+)nu(l) at Belle. In: Physical Review D, Bd. 100, Nr. 5, 052007

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Abstract

We present a new measurement of the Cabibbo-Kobayashi-Maskawa matrix element vertical bar V-cb vertical bar from B-0 -> D*(-)l(+)nu(l) decays, reconstructed with the full Belle data set of 711 fb(-1) integrated luminosity. Two form factor parametrizations, originally conceived by the Caprivi-Lellouch-Neubert (CLN) and the Boyd, Grinstein and Lebed (BGL) groups, are used to extract the product F(1)eta(EW)vertical bar V-cb vertical bar and the decay form factors, where F(1) is the normalization factor and eta(EW) is a small electroweak correction. In the CLN parametrization we find F(1)eta(EW)vertical bar V-cb vertical bar = (35.06 +/- 0.15 +/- 0.56) x 10(-3), rho(2) = 1.106 +/- 0.031 +/- 0.007, R-1 (1) = 1.229 +/- 0.028 +/- 0.009, R-2(1) = 0.852 +/- 0.021 +/- 0.006. For the BGL parametrization we obtain ,F(1)eta(EW)vertical bar V-cb vertical bar = (34.93 +/- 0.23 +/- 0.59) x 10(-3), which is consistent with the world average when correcting for F(1)eta(EW). The branching fraction of B-0 -> D*(-)l(+)nu(l )is measured to be B(B-0 -> D*(-)l(+)nu(l))= (4.90 +/- 0.02 +/- 0.16)%. We also present a new test of lepton flavor universality violation in semileptonic B decays, B(B-0 -> D*(-)e(+)nu)/B(B-0 -> D*(-)mu(+)nu) = 1.01 +/- 0.01 +/- 0.03. The errors quoted correspond to the statistical and systematic uncertainties, respectively. This is the most precise measurement of F(1)eta(EW)vertical bar V-cb vertical bar and form factors to date and the first experimental study of the BGL form factor parametrization in an experimental measurement.

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