Abstract
We investigate titanium nitride (TiN) thin film coatings on silicon for CMOS-compatible sub-bandgap charge separation upon incident illumination, which is a key feature in the vast field of on-chip photodetection and related integrated photonic devices. Titanium nitride of tunable oxidation distributions serves as an adjustable broadband light absorber with high mechanical robustness and strong chemical resistivity. Backside-illuminated TiN on p-type Si (pSi) constitutes a self-powered and refractory alternative for photodetection, providing a photoresponsivity of about similar to 1 mA/W at 1250 nm and zero bias while outperforming conventional metal coatings such as gold (Au). Our study discloses that the enhanced photoresponse of TiN/pSi in the near-infrared spectral range is directly linked to trap states in an ultrathin TiO2-x interfacial interlayer that forms between TiN and Si. We show that a pSi substrate in conjunction with a few nanometer thick amorphous TiO2-x film can serve as a platform for photocurrent enhancement of various other metals such as Au and Ti. Moreover, the photoresponse of Au on a TiO2-x/pSi platform can be increased to about 4 mA/W under 0.45 V reverse bias at 1250 nm, allowing for controlled photoswitching. A clear deviation from the typically assumed Fowler-like response is observed, and an alternative mechanism is proposed to account for the metal/semiconductor TiO2-x interlayer, capable of facilitating hole transport.
| Dokumententyp: | Zeitschriftenartikel |
|---|---|
| Fakultät: | Physik |
| Themengebiete: | 500 Naturwissenschaften und Mathematik > 530 Physik |
| ISSN: | 2330-4022 |
| Sprache: | Englisch |
| Dokumenten ID: | 82884 |
| Datum der Veröffentlichung auf Open Access LMU: | 15. Dez. 2021, 15:04 |
| Letzte Änderungen: | 15. Dez. 2021, 15:04 |
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