Characterization of e-beam evaporated Ge, YbF3, ZnS, and LaF3 thin films for laser-oriented coatings

Amotchkina, Tatiana V.; Trubetskov, Michael K.; Hahner, Daniel und Pervak, Volodymyr (2020): Characterization of e-beam evaporated Ge, YbF3, ZnS, and LaF3 thin films for laser-oriented coatings. In: Applied Optics, Bd. 59, Nr. 5: A40-A47

Abstract

Thin films of Ge, ZnS, YbF3, and LaF3 produced using e-beam evaporation on ZnSe andGe substrateswere characterized in the range of 0.4-12 mu m. It was found that the Sellmeier model provides the best fit for refractive indices of ZnSe substrate, ZnS, and LaF3 films;the Cauchy model provides the best fit for YbF3 film. Optical constants of Ge substrate and Ge film as well as extinction coefficients of ZnS, YbF3, LaF3, and ZnSe substrate are presented in the frame of a non-parametric model. For the extinction coefficient of ZnS, the exponential model is applicable. Stresses in Ge, ZnS, YbF3, and LaF3 were estimated equal to (-50) MPa, (-400) MPa, 140 MPa, and 380 MPa, respectively. The surface roughness does not exceed 5 nm for all films and substrates. (C) 2019 Optical Society of America

• Dokumententyp: Zeitschriftenartikel
• Fakultät: Physik
• Themengebiete: 500 Naturwissenschaften und Mathematik > 530 Physik
• ISSN: 1559-128X
• Sprache: Englisch