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Lorenzen, Tizian 
ORCID: https://orcid.org/0009-0003-3082-6540; Diederichs, Benedikt ORCID: https://orcid.org/0009-0002-2301-9583; Otieno Ogolla, Charles ORCID: https://orcid.org/0000-0001-9507-3576; Butz, Benjamin ORCID: https://orcid.org/0000-0002-9744-3419 und Müller-Caspary, Knut ORCID: https://orcid.org/0000-0002-2588-7993
(2025):
Aberration measurement by electron ptychography and consistency among different algorithms.
In: Applied Physics Letters, Bd. 126, Nr. 8, 081602
[PDF, 3MB]
ORCID: https://orcid.org/0009-0003-3082-6540; Diederichs, Benedikt ORCID: https://orcid.org/0009-0002-2301-9583; Otieno Ogolla, Charles ORCID: https://orcid.org/0000-0001-9507-3576; Butz, Benjamin ORCID: https://orcid.org/0000-0002-9744-3419 und Müller-Caspary, Knut ORCID: https://orcid.org/0000-0002-2588-7993
(2025):
Aberration measurement by electron ptychography and consistency among different algorithms.
In: Applied Physics Letters, Bd. 126, Nr. 8, 081602
[PDF, 3MB]