Abstract
In this study the authors present an x-ray analysis of the structure and of the interface of 1 ML Pr2 O3 on Si(111). The x-ray analysis shows that the interface is formed of a Si-O-Pr bond with Pr above the T4 adsorption site of silicon (111). The layer exhibits a thickness of 0.6 nm corresponding to one bulk unit cell from the hexagonal phase of Pr2 O3. The layer is well ordered with Pr-O bond lengths close to the bulk values and a Si-O distance of 0.18 nm.
Item Type: | Journal article |
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Faculties: | Geosciences > Department of Earth and Environmental Sciences > Crystallography and Materials Science |
Subjects: | 500 Science > 550 Earth sciences and geology |
Language: | English |
Item ID: | 18863 |
Date Deposited: | 10. Mar 2014, 14:16 |
Last Modified: | 04. Nov 2020, 13:00 |