Abstract
In this study the authors present an x-ray analysis of the structure and of the interface of 1 ML Pr2 O3 on Si(111). The x-ray analysis shows that the interface is formed of a Si-O-Pr bond with Pr above the T4 adsorption site of silicon (111). The layer exhibits a thickness of 0.6 nm corresponding to one bulk unit cell from the hexagonal phase of Pr2 O3. The layer is well ordered with Pr-O bond lengths close to the bulk values and a Si-O distance of 0.18 nm.
| Item Type: | Journal article |
|---|---|
| Faculties: | Geosciences > Department of Earth and Environmental Sciences > Crystallography and Materials Science |
| Subjects: | 500 Science > 550 Earth sciences and geology |
| Language: | English |
| Item ID: | 18863 |
| Date Deposited: | 10. Mar 2014 14:16 |
| Last Modified: | 04. Nov 2020 13:00 |
