Abstract
The interface roughness between gate insulator and semiconductor is expected to reduce the conductance of molecular field-effect transistors. This study merges atomic force microscopy data of layer topographies with self-consistent calculations of charge carrier densities and conductances within the channel region. It is found that a roughness equivalent to one monolayer reduces the conductance by nearly 50%. Currents flow mainly within the first monolayer of the semiconductor and along percolation pathways, where charges rarely undergo transfers between adjacent monolayers.
Dokumententyp: | Zeitschriftenartikel |
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Fakultät: | Physik |
Themengebiete: | 500 Naturwissenschaften und Mathematik > 530 Physik |
URN: | urn:nbn:de:bvb:19-epub-94903-3 |
ISSN: | 0003-6951 |
Sprache: | Englisch |
Dokumenten ID: | 94903 |
Datum der Veröffentlichung auf Open Access LMU: | 07. Mrz. 2023, 08:53 |
Letzte Änderungen: | 04. Jan. 2024, 11:21 |
DFG: | Gefördert durch die Deutsche Forschungsgemeinschaft (DFG) - 491502892 |