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Gruppiert nach: Dokumententyp | Veröffentlichungsdatum
Anzahl der Publikationen: 4

Zeitschriftenartikel

Sanakoyeu, Artsiom; Ma, Pingchuan; Tschernezki, Vadim und Ommer, Björn ORCID logoORCID: https://orcid.org/0000-0003-0766-120X (2021): Improving Deep Metric Learning by Divide and Conquer. In: IEEE Transactions on Pattern Analysis and Machine Intelligence, Bd. 44, Nr. 11: S. 8306-8320

Konferenzbeitrag

Kotovenko, Dmytro; Ma, Pingchuan; Milbich, Timo und Ommer, Björn ORCID logoORCID: https://orcid.org/0000-0003-0766-120X (2023): Cross-Image-Attention for Conditional Embeddings in Deep Metric Learning. 2023 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR), Vancouver, BC, Canada, 17-24 June 2023. In: 2023 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR), New York: IEEE. S. 11070-11081

Kotovenko, Dmytro; Ma, Pingchuan; Milbich, Timo ORCID logoORCID: https://orcid.org/0000-0002-5012-0874 und Ommer, Björn ORCID logoORCID: https://orcid.org/0000-0003-0766-120X (2023): Cross-Image-Attention for Conditional Embeddings in Deep Metric Learning. 2023 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR), Vancouver, BC, Canada, 17-24 June 2023. Institute of Electrical and Electronics Engineers (IEEE) (Hrsg.), In: CR-FIQA: Face Image Quality Assessment by Learning Sample Relative Classifiability, Piscataway, NJ: IEEE. S. 1170-1181

Kotovenko, Dmytro; Sanakoyeu, Artsiom; Ma, Pingchuan; Lang, Sabine und Ommer, Björn ORCID logoORCID: https://orcid.org/0000-0003-0766-120X (2019): A Content Transformation Block for Image Style Transfer. 2019 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR), Long Beach, CA, USA, 15-20 June 2019. In: 2019 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR), New York: IEEE. S. 10024-10033

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