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Anzahl der Publikationen: 7
Zeitschriftenartikel
Wang, Juan; Weber, Thomas; Aigner, Andreas; Maier, Stefan A. und Tittl, Andreas 
ORCID: https://orcid.org/0000-0003-3191-7164
(2023):
Mirror‐Coupled Plasmonic Bound States in the Continuum for Tunable Perfect Absorption.
In: Laser & Photonics Reviews, Bd. 17, Nr. 11
[PDF, 2MB]
ORCID: https://orcid.org/0000-0003-3191-7164
(2023):
Mirror‐Coupled Plasmonic Bound States in the Continuum for Tunable Perfect Absorption.
In: Laser & Photonics Reviews, Bd. 17, Nr. 11
[PDF, 2MB]
Kühner, Lucca; Sortino, Luca; Berté, Rodrigo; Wang, Juan; Ren, Haoran; Maier, Stefan A.; Kivshar, Yuri und Tittl, Andreas
(25. August 2022):
Radial bound states in the continuum for polarization-invariant nanophotonics.
In: Nature Communications, Bd. 13
[PDF, 2MB]
Wang, Juan; Maier, Stefan A. und Tittl, Andreas
(2022):
Trends in Nanophotonics-Enabled Optofluidic Biosensors.
In: Advanced Optical Materials, Bd. 10, Nr. 7
[PDF, 5MB]
Aigner, Andreas; Tittl, Andreas; Wang, Juan; Weber, Thomas; Kivshar, Yuri; Maier, Stefan A. und Ren, Haoran
(2022):
Plasmonic bound states in the continuum to tailor light-matter coupling.
In: Science Advances, Bd. 8, Nr. 49, eadd4816
Kühne, Julius; Wang, Juan; Weber, Thomas; Kühner, Lucca; Maier, Stefan A. und Tittl, Andreas
(2021):
Fabrication robustness in BIC metasurfaces.
In: Nanophotonics, Bd. 10, Nr. 17: S. 4305-4312
Wang, Juan; Kühne, Julius; Karamanos, Theodosios; Rockstuhl, Carsten; Maier, Stefan A. und Tittl, Andreas
(2021):
All-Dielectric Crescent Metasurface Sensor Driven by Bound States in the Continuum.
In: Advanced Functional Materials, Bd. 31, Nr. 46, 2104652
Konferenzbeitrag
Kuhne, Julius; Weber, Thomas; Kuhner, Lucca; Wang, Juan; Maier, Stefan A. und Tittl, Andreas
(2021):
Fabrication tolerance impact on BIC metasurface resonances.
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), Munich, Germany, 21-25 June 2021.
In: 2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC),
New York: IEEE.